◆ Application for FPD :

• Organic Removal Replacing EUV or Ozone Cleaner
• Hydrophilic from Hydrophobic
• Particle Removal
• Surface Treatment

◆ Poled Dipole Electrode, APIS-F^TM :

• Patent Pending
• FPD Application
• with Wet Process Cleaning Module Optional
• New System or Remodeling Available
• Minimized Surface Charge Build-up

◆ Cost & Technology Competitiveness :

• Larger Substrate Available
• Cost Effectiveness under Atmospheric Environment
• Lowest CoO - very few moving parts and longer life time
• Productivity Improvement with lower down time
• Multi-Electrode
• Customized Configuration
• Non-toxic Environment (Dry in - Dry out)

◆ Wettability after APIS-F^TM Multi-structured,
    Ar/He Process,5㎝/sec Speed :

• ITO/Mo/AlNd Layer : 5˚, Single Module
• Cr Layer                : 6˚, Double Module