With the field proven technology of HDP Oxide Etch Chamber and field experienced engineering, We hold ourself ready to give you our plantiful servive with our new system.
Oxide Etching System
High Density Plasma, Low Pressure Processing
Etching for Deep-Contact and SAC ( Self Aligned Contact), especially
Lower CoC, Higher Performance
Applicable to Nano Design rule
NEOSTM ADF Oxide Etcher 8~12 inch HDP Oxide Etcher Under Development
347-52, Banwol-ri, Taean-eup, Hwaseong-si, Gyeonggi-do, KOREA Tel : +82-31-205-5925 Fax : +82-31-205-5926
